Research - Measurement Standardization

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Dr. JeongWon Kim

Division of Industrial Metrology

Korea Research Institute of Standards & Science
267 Gajeong-Ro

Daejeon 34113

Republic of Korea

Phone
Fax:

+82-(0)42-868-5761

+82-(0)42-868-5032

As a national research institute for standards, we are developing metrology for international standardization. Under ISO/TC201 (Surface Chemical Analysis), Work function measurement procedure by UPS is proposed as a new project. In combination with convention optical methods, x-ray reflectometry, and TEM, the thickness of ultrathin films are measured by angle-resolved photoelectron spectroscopy.

 

 Angle-resolved x-ray photoelectron spectroscopy

Silicon oxide overlayer on an amorhous Si substrate shows photoelectron intensity governed by the following formula. If the intensity of each oxide component are measured as a function of emission angle, the oxide thickness is derived using an electron attenuation length which is a function of electron kinetic energy and material.

 

 

 Work function measurement

Illustration of WF measurement by UPS (He I light source) for metal and semiconductor. Here Δ means the WF difference of the two materials. When two materials are in contact, the Δ acts as an interface dipole.

 

 

 

 

 

 

 

전시 유성구 가정로 267 한국표준과학연구원 산업응용측정본부 나노구조측정센터

(313) B-16, Tel. 042-868-5977

대전시 유성구 가정로 217 과학기술연합대학원대학교 나노계측과학과

 

File last modified: Apr. 1, 2019